The Atomic Layer Deposition Global Market Report 2023, provides comprehensive information on the atomic layer deposition market across 60+ geographies in the seven regions – Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East, Africa for the 27 major global industries. The report covers a ten year historic period – 2010-2021, and a ten year forecast period – 2023-2032.
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As per The Business Research Company’s Atomic Layer Deposition Global Market Report 2023, the global atomic layer deposition market size is expected to grow from $2.53 billion in 2022 to $2.76 billion in 2023 at a compound annual growth rate (CAGR) of 9%. The Russia-Ukraine war disrupted the chances of global economic recovery from the COVID-19 pandemic, at least in the short term. The war between these two countries has led to economic sanctions on multiple countries, a surge in commodity prices, and supply chain disruptions, causing inflation across goods and services and affecting many markets across the globe. The global atomic layer deposition market size is expected to reach $3.77 billion in 2027 at a CAGR of 8.1%.
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Product innovation is the key trend gaining popularity in the atomic layer deposition market. Major players operating in the atomic layer deposition market are focusing on developing atomic layer deposition platforms for new applications. For instance, in October 2022, Samco Inc., a Japan-based manufacturer of semiconductor process equipment for the fabrication of electronic components and nano-scale devices, launched a new plasma-enhanced atomic layer deposition (PEALD) system, AD-800LP. The system’s primary objective is to depose gate oxide films for the next generation of silicon carbide (SiC) and gallium nitride (GaN) power devices, which will be crucial in the transition to carbon neutrality. In addition to the traditional thermal ALD capability, the plasma-enhanced ALD system AD-800LP is a multi-purpose R&D system outfitted with a particular ICP plasma source named Tornado ICP. Tornado ICP, a Samco-exclusive plasma technology that differs from distant plasma, permits the deposition of diverse films using the AD-800LP, including oxide and nitride films. Tornado ICP allows steady plasma discharge for ALD deposition even at high pressures.
The atomic layer deposition market is segmented:
1) By Type: Metal ALD, Aluminum oxide ALD, Plasma Enhanced ALD, Catalytic ALD, Other Types
2) By Process: Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD)
3) By End User: Semiconductors And Electronics, Chemicals, Energy, Healthcare, Other End Users
Asia-Pacific was the largest region in the atomic layer deposition market in 2022.
The table of contents in TBRC’s atomic layer deposition market report includes:
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