The Business Research Company’s report on the Photolithography Equipment Market provides insights into the global market size, growth rate, regional distribution, competitive landscape, key segments, emerging trends, and strategic opportunities.
What are the key drivers behind the photolithography equipment market’s growth in recent years?
An increase in the demand for the Internet of Things (IoTs) is expected to propel the growth of the photolithography equipment market going forward. The Internet of Things (IoT) refers to a networked system of connected computers, mechanical and digital equipment, objects, animals, or people with unique identifiers (UIDs) and the ability to transfer data without human-to-human or human-to-computer contact. Manufacturers can achieve real-time monitoring and control, predictive maintenance, and data-driven optimization by incorporating IoT technology into photolithography equipment. This allows for better process management, decreased downtime, and enhanced overall equipment performance. For instance, in September 2022, according to a report published by the Global Mobile Supplier Association, a UK-based not-for-profit industry organization representing suppliers in the mobile communication industry, nearly 60% of cellular IoT connections are expected to be broadband IoT by the end of 2028, with 4G connecting the majority. Globally, there were 13.2 billion IoT connections in 2022, increasing to 34.7 billion connections predicted by 2028, indicating an 18% growth rate. Therefore, the increase in the demand for the Internet of Things (IoTs) will drive the photolithography equipment market.
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How does the future projection of the photolithography equipment market size compare to its historical growth?
The photolithography equipment market size has grown strongly in recent years. It will grow from $12.52 billion in 2024 to $13.77 billion in 2025 at a compound annual growth rate (CAGR) of 10.0%. The growth in the historic period can be attributed to growth in the semiconductor industry, resolution enhancement techniques, integrated circuit (IC) evolution, demand for high-speed computing, and materials science advances
The photolithography equipment market size is expected to see strong growth in the next few years. It will grow to $19.88 billion in 2029 at a compound annual growth rate (CAGR) of 9.6%. The growth in the forecast period can be attributed to growing 5g technology, quantum computing, the rise of IoT devices, more efficient energy storage, and flexible electronics. Major trends in the forecast period include wafer-level packaging, maskless lithography, 3d semiconductor stacking, directed self-assembly (DSA), and extreme ultraviolet (EUV) lithography.
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Which key players are shaping the future of the photolithography equipment market?
Major companies operating in the photolithography equipment market include Samsung Electronics Co. Ltd., Taiwan Semiconductor Manufacturing Company Limited, Canon Inc., Applied Materials Inc., ASML Holding NV, ZEISS Group, KLA Corporation, Nikon Corporation, JEOL Ltd., Onto Innovation Inc., Vecco Instruments Inc., NuFlare Technology Inc., EV Group, NIL Technology ApS, Holmarc Opto-Mechatronics Pvt Ltd., Orthogonal Inc., Microfab Service GmbH, microfab Service GmbH, S-Cubed Inc., Eulitha AG, Eulitha AG, Osiris International GmbH, Rudolph Technology & Associates, Shanghai Micro Electronics Equipment (Group) Co. Ltd. (SMEE), Orthogonal Inc.
What trends will propel the growth and evolution of the photolithography equipment market?
Major companies in the photolithography equipment market are focused on developing cutting-edge systems, such as immersion lithography systems, to address challenges in 3D semiconductor manufacturing and gain a competitive edge in the market. An immersion lithography system is a semiconductor manufacturing tool where a liquid, typically water, is used as an optical medium between the projection lens and the wafer during exposure. For instance, in December 2023, Nikon Corporation, a Japan-based manufacturer and distributor of optical instruments, launched the NSR-S636E ArF immersion scanner, a cutting-edge immersion lithography system designed for critical layers in semiconductor manufacturing. This scanner offers superior overlay accuracy and ultra-high throughput, making it ideal for diverse structures, including 3D semiconductor devices. With an enhanced inline Alignment Station (iAS) for advanced wafer measurement and correction capabilities, it addresses challenges in 3D semiconductor manufacturing, ensuring high precision and improved overlay performance without compromising productivity.
Which regions are expected to become dominant players in the photolithography equipment market?
North America was the largest region in the photolithography equipment market in 2024. Asia-Pacific is expected to be the fastest-growing region in the forecast period. The regions covered in the photolithography equipment market report are Asia-Pacific, Western Europe, Eastern Europe, North America, South America, Middle East, Africa.
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What are the emerging key segments in the photolithography equipment market, and how are they evolving?
The photolithography equipment market covered in this report is segmented –
1) By Process: Deep Ultraviolet (DUV), Extreme Ultraviolet (EUV), I-line, Krypton Fluoride (KrF), Argon Fluoride (ArF) Dry, Other Processes
2) By Wavelength: 370 nm–270 nm, 270 nm–170 nm, 70 nm–1 nm
3) By Light Source: Mercury Lamps, Fluorine Lasers, Excimer Lasers, Lased-Produced Plasma
4) By Application: Front-End, Back-End
5) By End-User: Integrated Device Manufacturer (IDM), Foundries
Subsegments:
1) By Deep Ultraviolet (DUV): 248 nm (KrF), 193 nm (ArF)
2) By Extreme Ultraviolet (EUV): 13.5 nm
3) By I-line: 365 nm
4) By Krypton Fluoride (KrF): 248 nm
5) By Argon Fluoride (ArF) Dry: 193 nm
6) By Other Processes: Electron Beam Lithography, Nanoimprint Lithography
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What defines the structure and scope of the photolithography equipment market?
Photolithography equipment refers to transferring circuit or device designs onto a substrate using a patterned mask and a beam of light or electrons to expose a photoresist layer selectively. It is used to design items on a thin layer or the bulk of a substrate, such as a silicon wafer.
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